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    Annealing of deposited SiO2 thin films: full-atomistic simulation results

  • Grigoriev F.V., Katkova E.V., Sulimov A.V., Sulimov V.B., Tikhonravov A.V.
    Журнал 
    Optical Materials Express
    Опубликована 
    Friday, 1. January 2016
    URL_istina 
    http://istina.msu.ru/publications/article/34542150/
    journalRanking 
    2.67

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